The High-k and ALD/CVD Metal Precursors Market size is expected to grow at an annual average of % during 2021-2027. Materials have high dielectric values and are used to quickly access and store data. ALD not only provides thickness control at the angstrom level, but also provides incredible deposition conformality at high aspect ratio structures. ALD technology is used to produce thin films using high-k dielectric materials such as Al2O3, Ta2O5, HfO2, ZrO2 for DRAM, and high-k gate oxides and nitrides for electrodes and interconnects.
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Company Profile
- Air Liquide
- Dow Chemicals
- Air Products and Chemicals Inc.
- Merck Group
- Nanmat Technology Co. Ltd.
- Praxair Technology Inc.
- Samsung Electronics Co. Ltd.
Market – Segmentation
By Technology
- Interconnect
- Capacitors
- Gates
By Industry Vertical
- Consumer Electronics
- Aerospace and Defence
- IT and Telecommunication
- Industrial
- Automotive
- Healthcare
- Others
Scope of the Report
The research study analyzes the Global High-k and ALD/CVD Metal Precursors Market industry from 360-degree analysis of the market thoroughly delivering insights into the market for better business decisions, considering multiple aspects some of which are listed below as:
Recent Developments
o Market Overview and growth analysis
o Import and Export Overview
o Volume Analysis
o Current Market Trends and Future Outlook
o Market Opportunistic and Attractive Investment Segment
A full report Global High-k and ALD/CVD Metal Precursors Market of is available at: https://www.orionmarketreports.com/high-k-and-ald-cvd-metal-precursors-market/37792/
Geographic Coverage
o North America Market Size and/or Volume
o Latin America Market Size and/or Volume
o Europe Market Size and/or Volume
o Asia-Pacific Market Size and/or Volume
o Rest of the world Market Size and/or Volume
Key Questions Answered by High-k and ALD/CVD Metal Precursors Market Report
1. What was the High-k and ALD/CVD Metal Precursors Market size in 2019 and 2020; what are the estimated growth trends and market forecast (2021-2027).
2. What will be the CAGR of the High-k and ALD/CVD Metal Precursors Market during the forecast period (2021-2027)?
3. Which segments (product type/applications/end-user) were most attractive for investments in 2021? How these segments are expected to grow during the forecast period (2021-2027).
4. Which manufacturer/vendor/players in the High-k and ALD/CVD Metal Precursors Market was the market leader in 2020?
5. Overview on the existing product portfolio, products in the pipeline, and strategic initiatives taken by key vendors in the market.
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