Nanoimprint Lithography (NIL) System market is anticipated to grow at a CAGR of 15.8% during the forecast period (2024-2031). The market growth is driven by end-user industries such as electronic and semiconductor manufacturing, automotive, energy, and more. Additionally, the increasing technological advancements in nanotechnology, such as, aerogel, is boosting the market growth. Furthermore, the growing demand for miniature devices significantly contributes to the market growth during the forecast period.
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The global NIL systems market is segmented by technology type (into micro contact printing nanoimprint lithography, Ultraviolet Nanoimprint Lithography (UV-NIL), soft lithography, and Hot Embossing (HE)), end-user industry (into electronics and semiconductor, healthcare and life sciences, automotive, energy, and others), and by geography (into North America, Europe, Asia-Pacific, and the Rest of the World).
The demand for NIL systems is constantly growing in the healthcare and life sciences industry for the creation of precise nanostructures. NIL systems are used to manufacture and research biosensors and diagnostic devices, enhancing sensitivity and accuracy. The technology helps in the production of nanostructured drug delivery systems to improve solubility and facilitate controlled release. Furthermore, it helps in personalized medicine by modifying drug formulations and is used in designing advanced pharmaceutical devices such as microneedles and gene therapy carriers.
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North America accounts for the highest share of the global NIL system market owing to the strong presence of the region in global electronics and semiconductor manufacturing. The growing government support for domestic manufacturing and R&D by policies such as the CHIPS and Science Act is contributing significantly to the growth of the regional market. According to the Semiconductor Industry Association (SIA), the US semiconductor industry is leading with half the market share (50.2%). It is projected to grow with the highest growth percentage of 203% by 2032.
The major companies serving the global NIL System market are Eulitha AG, EV Group, Micro Resist Technology GmbH, and SET Corporation SA among others. The market players are considerably contributing to the market growth by adopting various strategies including mergers and acquisitions, partnerships, collaborations, funding, and new product launches.
Recent Developments
- In September 2024, Canon Inc. announced to shipment of the FPA-1200NZ2C nanoimprint lithography (NIL) system for semiconductor manufacturing, to the Texas Institute for Electronics. The circuit patterns in the system are different from conventional projection exposure technology.
- In April 2024, FUJIFILM Corp. launched the Nanoimprint Resist. It is a semiconductor material compatible with nanoimprint lithography semiconductor manufacturing technology and will be available in Japan.
- In June 2022, Nanonex Corp. announced its strategic partnership with InterLitho Technology Ltd., to expand the reach of InterLitho throughout North America. The partnership will additionally broaden its portfolio with InterLitho’s nanopatterning systems.
- In June 2021, EV Group launched the EVG®770 NT step-and-repeat nanoimprint lithography (NIL) system. The product enables precise replication of micro- and nano-patterns for large-area master stamp fabrication used in high-volume manufacturing of Augmented Reality (AR) waveguides, Wafer-Level Optics (WLO), and advanced lab-on-a-chip devices.
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